Bai Qingyuan meets with CIPM President
Release time: 11月 17,2025 11:30 Information source:SAMR

On 10 November, Bai Qingyuan, Vice Minister of the State Administration for Market Regulation (SAMR), met with a four-member delegation, including Wynand Louw, President of the International Committee for Weights and Measures (CIPM), Henry Rotich, President of the Intra-Africa Metrology System (AFRIMETS) and Director for Metrology and Testing Division, Kenya Bureau of Standards (KEBS), and Abdellah Ziti, Director of Laboratoire Public d’Essais et d’Études, Laboratoire National de Métrologie (LPEE/LNM). The two sides exchanged views on topics such as deepening engagement with the international organizations of metrology and enhancing China-Africa cooperation in metrology.

Bai Qingyuan expressed gratitude to Wynand Louw for his congratulatory letter on the 40th anniversary of the promulgation of the "Metrology Law of the People's Republic of China",as well as for his long-standing concern and support of China's metrology development. He emphasized that SAMR will continue to support Chinese experts in participating in the international organizations of metrology, promote the implementation of CIPM 2030+ Strategy, and actively respond to new measurement demands arising from emerging technologies and global challenges. China is committed to strengthening bilateral and multilateral exchanges and collaboration with African partners such as South Africa and Kenya, and promote mutual recognition of measurements and "soft connectivity" in rules and standards for the joint development of the Belt and Road Initiative, with a view to contributing to the implementation of the outcomes under the Forum on China-Africa Cooperation.

Wynand Louw and other delegates appreciated China's achievements in metrology and its contributions to the global metrology system. They also expressed their expectation for the Chinese government to continue supporting international metrology activities and to promote a more practical China-Africa cooperation in metrology.

The meeting was also attended by senior officials from relevant departments and affiliated institute of SAMR.